半導體用高純金屬濺鍍靶材 High purity metal sputtering targets for Semiconductor

Al & AlCu, Cu, Co, Ti, Ta, W/TiW, WSi, Cr, CrSi

各種化合物濺射靶材Compound Sputtering Targets :

硫族元素化合物靶材 Chalcogenide Compound Target

GeSbTe, GeAsSe, ZnSe, As₂Se₃, MoS₂, WS₂, WSe₂, Sb₂Te₄, GeSe₂, GeTe

磁性材料Ferromagnetic Materials

Fe alloy, Co alloy, Ni alloy

壓電材料Piezoelectric Materials

鋁鈧合金濺射靶材Al-Sc(0-45at%) Sputter Target

氧化物半導體材料IGZO Sputtering Target

IGZO濺射靶材 InGaZnO₄ Sputtering Target

薄膜光伏材料Thin Film Photovoltaic Materials

CuInGaSe, In₂Se₃, In₂S₃

熱-電材料 Thermoelectric Materials

BiTeSe, BiSbTe, Bi₂Te₃